The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2018
Filed:
Sep. 11, 2008
Tadashi Miyagi, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Kazuhito Shigemori, Kyoto, JP;
Shuichi Yasuda, Kyoto, JP;
Masakazu Sanada, Kyoto, JP;
Tadashi Miyagi, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Kazuhito Shigemori, Kyoto, JP;
Shuichi Yasuda, Kyoto, JP;
Masakazu Sanada, Kyoto, JP;
Screen Semiconductor Solutions Co., Ltd., Kyoto, JP;
Abstract
After a development liquid on a substrate is washed away with a rinse liquid, the rotational speed of the substrate is reduced, so that a liquid layer of the rinse liquid is formed over a top surface of the substrate. Thereafter, the rotational speed of the substrate is increased. The increase in the rotational speed of the substrate causes a centrifugal force to be slightly greater than tension, thereby causing the liquid layer to be held on the substrate with the thickness thereof in its peripheral portion increased and the thickness thereof at the center thereof decreased. Then, gas is discharged toward the center of the liquid layer from a gas supply nozzle, so that a hole is formed at the center of the liquid layer. This causes tension that is balanced with a centrifugal force exerted on the peripheral portion of the liquid layer to disappear. Furthermore, the rotational speed of the substrate is further increased while the gas is discharged. Thus, the liquid layer moves outward from the substrate.