IDiyas

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12211708 B1

PDFFull Text
Date of Patent:
Jan. 28, 2025

Filed:

Nov. 29, 2023

Substrate processing apparatus and substrate processing method

Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Shuichi Yasuda, Kyoto, JP;

Kenji Kobayashi, Kyoto, JP;

Assignee:

SCREEN HOLDINGS CO., LTD., , JP;

Attorney:

OSTROLENK FABER LLP

Primary Examiner:

Mikhail Kornakov

Assistant Examiner:

Ryan L Coleman

Int. Cl.
CPC ...
H01L 21/02 (2006.01); B01F 23/40 (2022.01); B01F 23/45 (2022.01); B01F 23/454 (2022.01); B08B 3/00 (2006.01); H01L 21/67 (2006.01); B01F 35/221 (2022.01); B01F 35/83 (2022.01);
U.S. Cl.
CPC ...
H01L 21/67023 (2013.01); B01F 23/40 (2022.01); B01F 23/45 (2022.01); B01F 23/454 (2022.01); B01F 23/49 (2022.01); B08B 3/00 (2013.01); H01L 21/67017 (2013.01); H01L 21/67034 (2013.01); H01L 21/67051 (2013.01); H01L 21/6708 (2013.01); H01L 21/67253 (2013.01); B01F 35/2211 (2022.01); B01F 35/833 (2022.01); Y10T 137/0396 (2015.04);
Abstract

First and second concentration measurement parts () are provided in first and second supply liquid lines () in which first and second supply liquids flow, respectively. A dissolved concentration of gas in the second supply liquid is lower than that in the first supply liquid. In the first and second supply liquid lines, respective one ends of first and second branch lines () are connected to respective positions on the upstream side of the concentration measurement parts. The other ends of the first and second branch lines are connected to a mixing part (), and by mixing the first and second supply liquids, a processing liquid is generated. Respective flow rate adjustment parts () of the first and second branch lines are controlled on the basis of respective measured values of the first and second concentration measurement parts so that the dissolved concentration of the gas in the processing liquid can become a set value. It is thereby possible to prevent the supply liquid containing particles or the like caused by the concentration measurement part from being contained into the processing liquid to be supplied to a substrate and also to adjust the dissolved concentration of the gas in the processing liquid to the set value with high accuracy.

Find Patent Forward Citations

Loading…