The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2013
Filed:
Feb. 02, 2010
Shuichi Yasuda, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Koji Kaneyama, Kyoto, JP;
Tadashi Miyagi, Kyoto, JP;
Kazuhito Shigemori, Kyoto, JP;
Toru Asano, Kyoto, JP;
Yukio Toriyama, Kyoto, JP;
Takashi Taguchi, Kyoto, JP;
Tsuyoshi Mitsuhashi, Kyoto, JP;
Tsuyoshi Okumura, Kyoto, JP;
Shuichi Yasuda, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Koji Kaneyama, Kyoto, JP;
Tadashi Miyagi, Kyoto, JP;
Kazuhito Shigemori, Kyoto, JP;
Toru Asano, Kyoto, JP;
Yukio Toriyama, Kyoto, JP;
Takashi Taguchi, Kyoto, JP;
Tsuyoshi Mitsuhashi, Kyoto, JP;
Tsuyoshi Okumura, Kyoto, JP;
Sokudo Co., Ltd., Kyoto, JP;
Abstract
A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of: forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device. The method also includes applying washing processing to the substrate by said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device and transporting the substrate after the washing processing to said exposure device. The method further includes transporting the substrate from said exposure device and applying development processing by said third processing unit to the substrate transported after the exposure processing by said exposure device.