Tsuyoshi Okumura

Title: The Innovative Contributions of Tsuyoshi Okumura

Introduction: Tsuyoshi Okumura, an accomplished inventor based in Kyoto, Japan, has made significant contributions to the field of substrate processing technology. With a total of nine patents to his name, Okumura's work focuses on enhancing the efficiency and effectiveness of substrate processing methods and devices.

Latest Patents: Among his latest innovations are two notable patents: a substrate processing method and a substrate processing device. The first patent details a method that involves a liquid discharging step where liquid is discharged through a nozzle towards a predetermined supply region on the substrate's main surface, followed by a humidified gas supplying step aimed at removing electrical charges. This process culminates in a spin-drying step that helps remove excess liquid from the substrate. The second patent outlines a comprehensive substrate processing method that includes forming a low surface tension liquid film, which is manipulated to widen an opening in the center of the film to facilitate removal. This method utilizes precise gas flow management to ensure optimal processing outcomes.

Career Highlights: Throughout his career, Okumura has worked with prominent companies in the semiconductor and technology sectors. He has been associated with Sokudo Co., Ltd. and Dainippon Screen Manufacturing Company, where his expertise has been pivotal in advancing substrate processing technologies.

Collaborations: Tsuyoshi Okumura has collaborated with notable industry professionals, including Koji Kaneyama and Shuichi Yasuda. These collaborations have likely contributed to the innovative edge of his patents, emphasizing the importance of teamwork in technological advancement.

Conclusion: Tsuyoshi Okumura's inventive spirit and dedication to substrate processing technology underscore the significant impact individual inventors can have in the field. His contributions are not only reflected in the patents he holds but also in the advancements they bring to industries relying on substrate processing methods and devices. As he continues to innovate, the potential for further advancements in this area remains promising.