The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2022
Filed:
Apr. 17, 2018
Screen Holdings Co., Ltd., Kyoto, JP;
Hiroki Tsujikawa, Kyoto, JP;
Masato Tanaka, Kyoto, JP;
Tsuyoshi Okumura, Kyoto, JP;
Atsuyasu Miura, Kyoto, JP;
Makoto Takaoka, Kyoto, JP;
Nobuyuki Miyaji, Kyoto, JP;
Kazuhiro Fujita, Kyoto, JP;
Naoki Sawazaki, Kyoto, JP;
Takashi Akiyama, Kyoto, JP;
Yuya Tsuchihashi, Kyoto, JP;
Abstract
A substrate processing method includes a liquid discharging step of discharging liquid through a nozzle toward a predetermined supply region on the main surface of a substrate held on a substrate holding unit within a chamber, a humidified gas supplying step of supplying humidified gas with a humidity higher than the humidity within the chamber onto the main surface of the substrate to remove electrical charges carried on the substrate, and a spin-drying step of rotating the substrate about a predetermined rotational axis after the liquid discharging step to spin off the liquid component from the main surface of the substrate. The humidified gas supplying step is started before the start of the liquid discharging step and ended at a predetermined termination timing after the start of the liquid discharging step and before the spin-drying step.