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For the Inventor, By the Inventor

Kyoto, Japan

Kazuhiro Fujita

USPTO Granted Patents = 13

Average Co-Inventor Count = 5.7

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:

goldMedal13 out of 1,111 
 
Screen Holdings Co., Ltd.
 patents

Years Active: 2019-2025

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13 patents (USPTO):Explore Patents
1. 12337289 - Chemical liquid preparation device, and substrate processing device (2025-06-24),
2. 12064739 - Chemical liquid preparation device, and substrate processing device (2024-08-20),
3. 11823921 - Substrate processing device and substrate processing method (2023-11-21),
4. 11521865 - Substrate processing method and substrate processing device (2022-12-06),
5. 11439967 - Chemical liquid preparation method, chemical liquid preparation device, and substrate processing device (2022-09-13),
6. 10786836 - Substrate processing method and substrate processing apparatus (2020-09-29),
7. 10741422 - Substrate processing device and substrate processing method (2020-08-11),
8. 10658203 - Substrate processing apparatus and processing cup cleaning method (2020-05-19),
9. 10639683 - Recovery piping cleaning method and substrate processing apparatus (2020-05-05),
10. 10636682 - Substrate processing apparatus (2020-04-28),
11. 10622225 - Substrate processing apparatus and nozzle cleaning method (2020-04-14),
12. 10553422 - Substrate treatment method of treating substrate, and substrate treatment apparatus (2020-02-04),
13. 10199243 - Substrate processing method and substrate processing apparatus (2019-02-05),

Title: Kazuhiro Fujita: Innovator in Chemical Liquid Preparation Technology

Introduction

Kazuhiro Fujita is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of chemical liquid preparation, holding a total of 13 patents. His work focuses on developing advanced methods and devices that enhance the efficiency and effectiveness of chemical processes.

Latest Patents

Fujita's latest patents include a chemical liquid preparation device and a substrate processing device. The chemical liquid preparation method involves preparing a TMAH-containing chemical liquid through a series of steps. These steps include establishing a correspondence relationship between the supply flow rate ratio of an oxygen-containing gas and an inert-gas-containing gas, and the resulting dissolved oxygen concentration in the TMAH-containing chemical liquid. Additionally, the method sets a target dissolved oxygen concentration and acquires the necessary supply flow rate ratio to achieve this target. The substrate processing device focuses on preparing a chemical liquid for treating films formed on substrates, utilizing a gas dissolving process to adjust the dissolved oxygen concentration by controlling the mixing ratio of the gases supplied.

Career Highlights

Kazuhiro Fujita is currently employed at Screen Holdings Co., Ltd., where he continues to innovate in the field of chemical liquid preparation. His work has been instrumental in advancing technologies that are crucial for various industrial applications.

Collaborations

Fujita collaborates with talented colleagues, including Hiroki Tsujikawa and Atsuyasu Miura, to further enhance the development of innovative solutions in their field.

Conclusion

Kazuhiro Fujita's contributions to chemical liquid preparation technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of chemical processes and a dedication to improving industrial applications.

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