The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2020

Filed:

Jul. 13, 2017
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Hiroki Tsujikawa, Kyoto, JP;

Masahide Ikeda, Kyoto, JP;

Atsuyasu Miura, Kyoto, JP;

Kazuhiro Fujita, Kyoto, JP;

Yuya Tsuchihashi, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/04 (2006.01); B08B 3/10 (2006.01); B08B 3/08 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); B08B 3/048 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); H01L 21/67017 (2013.01);
Abstract

A substrate processing apparatus includes a guard that catches liquid scattered outward from a spin chuck, a cup defining a liquid receiving groove to catch liquid that is guided downward by the guard, a guard elevating/lowering unit that moves the guard in an up/down direction, a cleaning liquid supplying unit that supplies cleaning liquid, discharged from a cleaning liquid nozzle, to the liquid receiving groove via the spin chuck and the guard, a cleaning liquid draining unit that drains the cleaning liquid in the liquid receiving groove, and a controller that controls the cleaning liquid supplying unit and the cleaning liquid draining unit to accumulate cleaning liquid in the liquid receiving groove and controls the guard elevating/lowering unit to cause a lower end portion of the cylindrical portion to be immersed in the cleaning liquid in the liquid receiving groove.


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