Kyoto, Japan

Masahide Ikeda


Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 535(Granted Patents)


Company Filing History:


Years Active: 1989-2020

Loading Chart...
7 patents (USPTO):Explore Patents

Title: Masahide Ikeda: Innovator in Substrate Processing Technology

Introduction

Masahide Ikeda is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 7 patents. His work focuses on improving the efficiency and effectiveness of substrate processing apparatuses.

Latest Patents

Ikeda's latest patents include innovative technologies such as a substrate processing apparatus and a processing cup cleaning method. The substrate processing apparatus features a guard that captures liquid scattered from a spin chuck, along with a cup designed to catch liquid guided downward by the guard. It also includes a guard elevating/lowering unit, a cleaning liquid supplying unit, and a cleaning liquid draining unit, all controlled by a sophisticated controller. The processing cup cleaning method involves cleaning recovery piping used for chemical liquid processing, ensuring that the interior of the recovery piping is effectively cleaned while managing the flow of cleaning liquids.

Career Highlights

Throughout his career, Masahide Ikeda has worked with notable companies such as Dainippon Screen Manufacturing Co., Ltd. and Screen Holdings Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in substrate processing technology.

Collaborations

Ikeda has collaborated with talented individuals in his field, including Yuya Tsuchihashi and Atsuyasu Miura. These collaborations have contributed to the advancement of substrate processing technologies and have fostered a spirit of innovation.

Conclusion

Masahide Ikeda's contributions to substrate processing technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in this critical area of technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…