The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 1996

Filed:

Dec. 09, 1993
Applicant:
Inventors:

Masahide Ikeda, Kyoto, JP;

Hiroshi Iwasa, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J / ;
U.S. Cl.
CPC ...
347241 ;
Abstract

An aperture plate is disposed between a reduction optical system (imaging optical system) and a light source unit in which a plurality of light source parts each emitting a light beam are arranged in a predetermined arrangement pattern. In the aperture plate, a plurality of apertures are arranged in the same pattern as the arrangement pattern of the light source parts. Light beams from the light source parts are directed toward the reduction optical system through the apertures which face the respective light source parts so that reduction images of the apertures are formed on a photosensitive material. Even if the light source parts are located a little displaced from a predetermined arrangement pattern, images of the apertures will be focused on a photosensitive material. This enables easy adjustment of the locations of the light source parts and recording of a high quality image.


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