Kyoto, Japan

Atsuyasu Miura

USPTO Granted Patents = 14 

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2015-2025

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14 patents (USPTO):Explore Patents

Title: Atsuyasu Miura: Innovator in Chemical Liquid Preparation Technology

Introduction

Atsuyasu Miura is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of chemical liquid preparation, holding a total of 14 patents. His work focuses on developing advanced methods and devices that enhance the efficiency and effectiveness of chemical processes.

Latest Patents

Miura's latest patents include a chemical liquid preparation device and a substrate processing device. The chemical liquid preparation method involves preparing a TMAH-containing chemical liquid through a series of steps. These steps include establishing a correspondence relationship between the supply flow rate ratio of an oxygen-containing gas and an inert-gas-containing gas, and the resulting dissolved oxygen concentration in the TMAH-containing chemical liquid. Additionally, the method sets a target dissolved oxygen concentration and acquires the necessary supply flow rate ratio to achieve this target. The substrate processing device focuses on preparing a chemical liquid for treating films formed on substrates, utilizing a gas dissolving process to adjust the dissolved oxygen concentration by controlling the mixing ratio of the gases supplied.

Career Highlights

Atsuyasu Miura is currently employed at Screen Holdings Co., Ltd., where he continues to innovate in the field of chemical liquid preparation. His expertise and dedication to research have positioned him as a key figure in his industry.

Collaborations

Miura has collaborated with notable colleagues, including Hiroki Tsujikawa and Kazuhiro Fujita. These partnerships have contributed to the advancement of technology in chemical processing.

Conclusion

Atsuyasu Miura's contributions to chemical liquid preparation technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of chemical processes and a drive to improve industry standards.

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