The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2019
Filed:
Jun. 22, 2017
Applicant:
Screen Holdings Co., Ltd., Kyoto, JP;
Inventors:
Atsuyasu Miura, Kyoto, JP;
Hidekazu Ishikawa, Kyoto, JP;
Assignee:
SCREEN Holdings Co., Ltd., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B01F 1/00 (2006.01); C09K 13/00 (2006.01); B01F 5/06 (2006.01); B01F 5/10 (2006.01); B01F 3/04 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6708 (2013.01); B01F 1/0038 (2013.01); B01F 3/04503 (2013.01); B01F 3/04737 (2013.01); B01F 3/04744 (2013.01); B01F 5/0614 (2013.01); B01F 5/10 (2013.01); B01F 5/102 (2013.01); C09K 13/00 (2013.01); H01L 21/30617 (2013.01); H01L 21/67017 (2013.01); H01L 21/67051 (2013.01); H01L 21/67253 (2013.01); B01F 2003/04879 (2013.01); B01F 2003/04921 (2013.01);
Abstract
A substrate processing system includes a chemical liquid preparation unit preparing a chemical liquid to be supplied to a substrate and a processing unit which supplies the chemical liquid, prepared by the chemical liquid preparation unit, to the substrate. The chemical liquid preparation unit supplies an oxygen-containing gas, containing oxygen gas, to a TMAH-containing chemical liquid, containing TMAH (tetramethylammonium hydroxide), to make the oxygen-containing gas dissolve in the TMAH-containing chemical liquid.