The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2011

Filed:

Mar. 30, 2007
Applicants:

Nobuyasu Hiraoka, Kyoto, JP;

Tsuyoshi Okumura, Kyoto, JP;

Akiyoshi Nakano, Kyoto, JP;

Inventors:

Nobuyasu Hiraoka, Kyoto, JP;

Tsuyoshi Okumura, Kyoto, JP;

Akiyoshi Nakano, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 1/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate treatment apparatus includes a substrate holding mechanism for holding a substrate, a brush made of an elastically deformable material and having a cleaning surface formed in a shape tapered toward one side in a perpendicular direction perpendicular to one surface of the substrate held by the substrate holding mechanism and inclined with respect to the perpendicular direction, a brush moving mechanism for moving the brush with respect to the substrate held by the substrate holding mechanism, and a control unit for controlling the brush moving mechanism so that the cleaning surface is pushed to a peripheral area on the one surface and a peripheral end face of the substrate held by the substrate holding mechanism.


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