The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2013
Filed:
Apr. 06, 2010
Koji Kaneyama, Kyoto, JP;
Akihiro Hisai, Kyoto, JP;
Toru Asano, Kyoto, JP;
Hiroshi Kobayashi, Kyoto, JP;
Tsuyoshi Okumura, Kyoto, JP;
Shuichi Yasuda, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Tadashi Miyagi, Kyoto, JP;
Kazuhito Shigemori, Kyoto, JP;
Koji Kaneyama, Kyoto, JP;
Akihiro Hisai, Kyoto, JP;
Toru Asano, Kyoto, JP;
Hiroshi Kobayashi, Kyoto, JP;
Tsuyoshi Okumura, Kyoto, JP;
Shuichi Yasuda, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Tadashi Miyagi, Kyoto, JP;
Kazuhito Shigemori, Kyoto, JP;
Sokudo Co., Ltd., Kyoto, JP;
Abstract
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.