The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
Dec. 06, 2005
Shuichi Yasuda, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Koji Kaneyama, Kyoto, JP;
Tadashi Miyagi, Kyoto, JP;
Kazuhito Shigemori, Kyoto, JP;
Toru Asano, Kyoto, JP;
Yukio Toriyama, Kyoto, JP;
Takashi Taguchi, Kyoto, JP;
Tsuyoshi Mitsuhashi, Kyoto, JP;
Tsuyoshi Okumura, Kyoto, JP;
Shuichi Yasuda, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Koji Kaneyama, Kyoto, JP;
Tadashi Miyagi, Kyoto, JP;
Kazuhito Shigemori, Kyoto, JP;
Toru Asano, Kyoto, JP;
Yukio Toriyama, Kyoto, JP;
Takashi Taguchi, Kyoto, JP;
Tsuyoshi Mitsuhashi, Kyoto, JP;
Tsuyoshi Okumura, Kyoto, JP;
Sokudo Co., Ltd., Kyoto, JP;
Abstract
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a processing block for liquid immersion exposure processing, and an interface block. An exposure device is arranged adjacent to the interface block. The processing block for liquid immersion exposure processing comprises a coating processing group for resist cover film and a removal processing group for resist cover film. The resist cover film is formed in the processing block for liquid immersion exposure processing before the exposure processing. The resist cover film is removed in the processing block for liquid immersion exposure processing after the exposure processing.