The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2019
Filed:
Feb. 28, 2017
Applicant:
Screen Holdings Co., Ltd., Kyoto, JP;
Inventors:
Masashi Kanaoka, Kyoto, JP;
Masanori Imamura, Kyoto, JP;
Taiji Matsu, Kyoto, JP;
Hidetoshi Sagawa, Kyoto, JP;
Atsushi Tanaka, Kyoto, JP;
Kazuhiro Tadokoro, Kyoto, JP;
Kazuya Ono, Kyoto, JP;
Shinichi Takada, Kyoto, JP;
Tsuyoshi Mitsuhashi, Kyoto, JP;
Assignee:
SCREEN Holdings Co., Ltd., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/327 (2013.01);
Abstract
A substrate treating method includes a determining step for determining a treating condition for hydrophobizing a surface of a substrate, based on a target regarding a dissolved area size in a resist pattern, and a treating step for hydrophobizing the surface of the substrate with the treating condition determined in the determining step before forming resist film on the surface of the substrate.