Company Filing History:
Years Active: 2013-2022
Title: Hidetoshi Sagawa: Innovator in Treating Solution Supply Apparatus
Introduction
Hidetoshi Sagawa is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of treating solution supply apparatus, holding a total of six patents. His innovative designs have advanced the technology used in substrate treatment processes.
Latest Patents
One of Sagawa's latest patents is a treating solution supply apparatus that efficiently supplies a treating solution for treating a substrate. This apparatus includes a liquid passage that allows the treating solution to flow through it, along with a pump that features a chamber with a variable volume. This chamber receives and feeds the treating solution from and to the liquid passage, while an electrically driven chamber driver varies the volume of the chamber. The arrangement of the liquid passage, chamber, and chamber driver is lateral, enhancing the apparatus's functionality.
Another significant patent involves a pumping apparatus and treatment solution supplying device. This device features a chamber with three openings, where the second opening is positioned higher than the first and third openings. This design allows air bubbles to collect around the second opening due to buoyancy. Additionally, the chamber includes an upper slope on its inner wall, which guides air bubbles to the second opening, facilitating their discharge from the chamber.
Career Highlights
Hidetoshi Sagawa has worked with prominent companies such as Screen Holdings Co., Ltd. and Sokudo Co., Ltd. His experience in these organizations has contributed to his expertise in developing innovative solutions for treating substrates.
Collaborations
Sagawa has collaborated with notable coworkers, including Junki Nishimura and Hiroyuki Ogura. Their teamwork has likely played a role in the successful development of his patented technologies.
Conclusion
Hidetoshi Sagawa's contributions to the field of treating solution supply apparatus demonstrate his innovative spirit and technical expertise. His patents reflect a commitment to improving substrate treatment processes, making him a significant figure in his industry.