The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
Oct. 06, 2010
Masanori Imamura, Kyoto, JP;
Akihiro Hisai, Kyoto, JP;
Hidetoshi Sagawa, Kyoto, JP;
Sokudo Co., Ltd., , JP;
Abstract
After a solvent is discharged onto a substrate in a period from a time point tto a time point t, rotation of the substrate is started at a time point t. A resist liquid is discharged onto a center portion of a target surface of the substrate at a time point t. A rotation speed of the substrate starts to decrease at a time point t, and attains a first speed after a certain period of time. The discharge of the resist liquid is stopped at a time point t. The rotation of the substrate is accelerated in a period from a time point tto a time point t, and the rotation speed of the substrate attains a second speed at the time point t. The rotation of the substrate is decelerated in a period from the time point tto a time point t, and the rotation speed of the substrate attains a third speed at the time point t. Here, deceleration of the rotation of the substrate in the period from the time point tto the time point tis smaller than acceleration of the rotation of the substrate in the period from the time point tto the time point t