Masanori Imamura

Title: Masanori Imamura: Innovator in Substrate Treatment and Coating Technologies

Introduction

Masanori Imamura is a distinguished inventor based in Kyoto, Japan. He has made significant contributions to the fields of substrate treatment and coating technologies, holding a total of six patents. His innovative approaches have enhanced the quality and efficiency of various processes in the semiconductor industry.

Latest Patents

One of Imamura's latest patents is a substrate treating method. This method involves supplying a solvent to the center part of a substrate while increasing the rotation speed of the substrate. The solvent is successively supplied until it reaches the periphery edge of the substrate. This technique ensures that the solvent covers the substrate surface entirely, effectively suppressing particles and improving quality. Another notable patent is a coating apparatus that features an open/close valve controlled by a motor. This allows for precise control of the opening and closing operations based on electric signals from a controller. Additionally, the apparatus includes a suck back valve that manages flow variations, facilitating simple liquid cut-off adjustments.

Career Highlights

Masanori Imamura has worked with prominent companies such as Screen Holdings Co., Ltd. and Screen Semiconductor Solutions Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative technologies, contributing to advancements in the semiconductor sector.

Collaborations

Imamura has collaborated with notable colleagues, including Hidetoshi Sagawa and Kazuo Morioka. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Masanori Imamura's contributions to substrate treatment and coating technologies have made a significant impact in the semiconductor industry. His innovative patents and collaborations highlight his role as a leading inventor in this field.