The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2016

Filed:

Jul. 03, 2014
Applicants:

Dainippon Screen Mfg. Co., Ltd., Kyoto, JP;

Sokudo Co., Ltd., Kyoto, JP;

Inventors:

Kazuo Morioka, Kyoto, JP;

Masanori Imamura, Kyoto, JP;

Satoshi Yamamoto, Kyoto, JP;

Hideki Shimizu, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/08 (2006.01); B08B 3/04 (2006.01); B05B 15/00 (2006.01); H01L 21/67 (2006.01); B05C 11/10 (2006.01); G03F 7/16 (2006.01); B05B 15/02 (2006.01); B08B 9/02 (2006.01); G03F 7/42 (2006.01);
U.S. Cl.
CPC ...
G03F 7/16 (2013.01); B05B 15/025 (2013.01); B08B 3/04 (2013.01); B08B 3/08 (2013.01); B08B 9/02 (2013.01); G03F 7/42 (2013.01); H01L 21/67017 (2013.01); H01L 21/67253 (2013.01); H01L 21/6715 (2013.01);
Abstract

Each chemical processing section includes a chemical liquid bottle, a buffer tank, a pump, a filter, a discharge valve and a discharge nozzle. A chemical liquid stored in the chemical liquid bottle is led to the discharge nozzle and is discharged from the discharge nozzle to a substrate. A cleaning processing section includes a solvent bottle, a cleaning liquid bottle, the buffer tank and the pump. A solvent stored in the solvent bottle, a cleaning liquid stored in the cleaning liquid bottle and a gas supplied from a gas supply source are selectively led to the discharge nozzle in each chemical liquid processing section.


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