The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 2018

Filed:

Aug. 30, 2016
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Masanori Imamura, Kyoto, JP;

Masashi Kanaoka, Kyoto, JP;

Hidetoshi Sagawa, Kyoto, JP;

Yoshinori Tawaratani, Kyoto, JP;

Masaaki Furukawa, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/12 (2006.01); B05D 1/00 (2006.01); B05D 3/10 (2006.01); H01L 21/67 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
B05D 1/005 (2013.01); B05D 3/107 (2013.01); H01L 21/6715 (2013.01); H01L 21/67253 (2013.01); H01L 51/001 (2013.01);
Abstract

A substrate is held and rotated in a horizontal attitude by a rotation holder. A coating liquid is supplied by a coating liquid supplier to a surface to be processed of the substrate rotated by the rotation holder. A first removal liquid is supplied by a first removal liquid supplier to a first annular region at a peripheral portion of the substrate rotated by the rotation holder before the coating liquid supplied by the coating liquid supplier loses fluidity. In this state, a supply position of the first removal liquid by the first removal liquid supplier is moved from an inner edge to an outer edge of the first annular region.


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