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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10920764 B1

PDFFull Text
Date of Patent:
Feb. 16, 2021

Filed:

Jul. 26, 2018

Pumping apparatus, treatment solution supplying device, substrate treating apparatus, liquid draining method, and liquid replacing method

Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Junki Nishimura, Kyoto, JP;

Hiroyuki Ogura, Kyoto, JP;

Masahito Kashiyama, Kyoto, JP;

Toru Momma, Kyoto, JP;

Shoji Kirita, Kyoto, JP;

Hidetoshi Sagawa, Kyoto, JP;

Shogo Yoshida, Kyoto, JP;

Assignee:

SCREEN Holdings Co., Ltd.;

Attorney:

Ostrolenk Faber LLP

Primary Examiner:

Nathan C Zollinger

Int. Cl.
CPC ...
F04B 43/02 (2006.01); F04F 1/06 (2006.01); F04B 43/08 (2006.01); F04F 1/12 (2006.01); F04B 23/02 (2006.01); F04B 23/04 (2006.01); F04B 49/22 (2006.01); F04B 53/20 (2006.01); F04B 53/16 (2006.01); F04B 23/06 (2006.01); F04B 7/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
F04B 43/02 (2013.01); F04B 23/02 (2013.01); F04B 23/04 (2013.01); F04B 23/06 (2013.01); F04B 43/08 (2013.01); F04B 49/22 (2013.01); F04B 53/16 (2013.01); F04B 53/20 (2013.01); F04F 1/06 (2013.01); F04F 1/12 (2013.01); H01L 21/67017 (2013.01); F04B 7/0076 (2013.01);
Abstract

A chamber has at least three openings, or a first opening, a second opening, and a third opening formed therein that are in communication with a reservoir. The second opening is higher in level than the first opening. The third opening is used for discharging a liquid within the reservoir by introducing gas through at least one of the first opening and the second opening into the reservoir. Since the third opening is the lowest in level among the three openings, the liquid stored in the reservoir is able to be drained easily.

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