The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2013

Filed:

Jun. 10, 2010
Applicants:

Koji Kaneyama, Kamigyo-ku, JP;

Masashi Kanaoka, Kamigyo-ku, JP;

Tadashi Miyagi, Kamigyo-ku, JP;

Kazuhito Shigemori, Kamigyo-ku, JP;

Shuichi Yasuda, Kamigyo-ku, JP;

Inventors:

Koji Kaneyama, Kamigyo-ku, JP;

Masashi Kanaoka, Kamigyo-ku, JP;

Tadashi Miyagi, Kamigyo-ku, JP;

Kazuhito Shigemori, Kamigyo-ku, JP;

Shuichi Yasuda, Kamigyo-ku, JP;

Assignee:

Sokudo Co., Ltd., Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/00 (2006.01); H01L 21/31 (2006.01); G03F 7/00 (2006.01); G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
Abstract

The transporting process from cleaning and drying processing of a substrate in a cleaning/drying processing unit in a cleaning/drying processing group to post-exposure bake (PEB) of the substrate in a thermal processing group for post-exposure bake in a cleaning/drying processing block is described below. First, after the substrate after exposure processing is subjected to the cleaning and drying processing in the cleaning/drying processing group, a sixth central robot takes out the substrate from the cleaning/drying processing group and carries that substrate into the thermal processing group for post-exposure bake in the cleaning/drying processing block.


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