The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2015
Filed:
Nov. 30, 2009
Koji Kaneyama, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Tadashi Miyagi, Kyoto, JP;
Kazuhito Shigemori, Kyoto, JP;
Shuichi Yasuda, Kyoto, JP;
Tetsuya Hamada, Kyoto, JP;
Koji Kaneyama, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Tadashi Miyagi, Kyoto, JP;
Kazuhito Shigemori, Kyoto, JP;
Shuichi Yasuda, Kyoto, JP;
Tetsuya Hamada, Kyoto, JP;
SCREEN Semiconductor Solutions Co., Ltd., Kyoto, JP;
Abstract
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a brush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.