The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2013
Filed:
Jul. 23, 2010
Koji Kaneyama, Kyoto, JP;
Kazuhito Shigemori, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Tadashi Miyagi, Kyoto, JP;
Shuichi Yasuda, Kyoto, JP;
Koji Kaneyama, Kyoto, JP;
Kazuhito Shigemori, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Tadashi Miyagi, Kyoto, JP;
Shuichi Yasuda, Kyoto, JP;
Abstract
A substrate processing method comprises the step of subjecting a substrate to drying processing in at least one of a processing section and an interface, wherein the step of subjecting the substrate to the drying processing comprises the steps of: rotating the substrate at a first rotational speed around an axis perpendicular to the substrate, while holding the substrate horizontally, forming a liquid layer on the substrate in a state where the substrate is rotated at the first rotational speed, gradually and continuously increasing the rotational speed of the substrate to a second rotational speed after the formation of the liquid layer, and starting discharging a gas to the liquid layer on the substrate while the substrate is rotated at the second rotational speed.