Lung Chen

Title: Lung Chen - Innovator in Semiconductor Technology

Introduction

Lung Chen is a prominent inventor based in Zhubei, Taiwan, known for his significant contributions to semiconductor technology. With a total of 18 patents to his name, he has made remarkable advancements in the field, particularly in the design and manufacturing of semiconductor devices.

Latest Patents

Among his latest patents, Chen has developed a source/drain structure for semiconductor devices. This patent describes a semiconductor structure and a method for forming it, which includes creating a recess structure in a substrate and forming a first semiconductor layer over this structure. The method involves doping different portions of the first semiconductor layer with varying concentrations of n-type dopants. Additionally, he has patented a method for manufacturing a semiconductor device that includes forming a fin structure over a substrate, which has a channel region and a source/drain region. This innovative approach enhances the efficiency and performance of semiconductor devices.

Career Highlights

Lung Chen has worked with notable companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and Silicon Integrated Systems Corporation. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in semiconductor manufacturing.

Collaborations

Throughout his career, Chen has collaborated with esteemed colleagues such as Kang-Min Kuo and Syun-Ming Jang. These partnerships have fostered innovation and have been instrumental in the development of advanced semiconductor technologies.

Conclusion

Lung Chen's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence the advancement of semiconductor devices, showcasing the importance of innovation in technology.