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For the Inventor, By the Inventor

Hsinchu, Taiwan

Kung Linliu

This inventor holds 22 USPTO granted patents and 1 published patent application, primarily in Inkjet Print Head. Top assignees: Worldwide Semiconductor Manufacturing Corporation, Taiwan Semiconductor Manufacturing Comp. Ltd., Nanodynamics, Inc.. Active years: 2000-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kung Linliu. Retrieved from https://idiyas.com/inventor/kung-linliu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 81.8

Average Co-Inventor Count = 1.4

ph-index = 7

Forward Citations = 284(Granted Patents)


Company Filing History:

goldMedal13 out of 112 
 
Worldwide Semiconductor Manufacturing Corporation
 patents
silverMedal5 out of 42,872 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents
bronzeMedal2 out of 30 
 
Nanodynamics, Inc.
 patents
4. 2 out of 27 
 
National Synchrotron Radiation Research Center
 patents

Years Active: 2000-2012

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Areas of Expertise:
Inkjet Print Head
Photolithography
Nozzle Plate
Anti-Reflective Coating
Semiconductor Capacitor
DRAM Fabrication
Planarization
Self-Aligned Process
Thin Film
Bit Lines
Capacitor Structure
Dynamic Storage Node
22 patents (USPTO):Explore Patents
1. 8303087 - Package structure of inkjet-printhead chip (2012-11-06),
2. 7954924 - Package method of inkjet-printhead chip and its structure (2011-06-07),
3. 6921629 - Self-aligned fabrication process for a nozzle plate of an inkjet print head (2005-07-26),
4. 6773094 - Method of using photolithography and etching for forming a nozzle plate of an inkjet print head (2004-08-10),
5. 6569760 - Method to prevent poison via (2003-05-27),
6. 6479401 - Method of forming a dual-layer anti-reflective coating (2002-11-12),
7. 6348707 - Method of manufacturing semiconductor capacitor (2002-02-19),
8. 6303431 - Method of fabricating bit lines (2001-10-16),
9. 6300240 - Method for forming bottom anti-reflective coating (BARC) (2001-10-09),
10. 6287957 - Self-aligned contact process (2001-09-11),
11. 6263586 - Device and method for planarizing a thin film (2001-07-24),
12. 6180483 - Structure and fabrication method for multiple crown capacitor (2001-01-30),
13. 6165909 - Method for fabricating capacitor (2000-12-26),
14. 6136646 - Method for manufacturing DRAM capacitor (2000-10-24),
15. 6133085 - Method for making a DRAM capacitor using a rotated photolithography mask (2000-10-17),

Title: Inventor Kung Linliu: Revolutionizing Technology in Hsinchu

Introduction: Kung Linliu is a visionary inventor based in Hsinchu, Taiwan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Kung Linliu holds several patents in the areas of semiconductor technology, renewable energy, and artificial intelligence, showcasing his diverse expertise and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Kung Linliu has worked with leading tech companies and research institutions, spearheading projects that have pushed the boundaries of what is possible in the tech industry.

Collaborations: Throughout his career, Kung Linliu has collaborated with top engineers, scientists, and researchers from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Inventor Kung Linliu's relentless pursuit of innovation and his passion for creating technology that shapes the future make him a true pioneer in the field of technology in Hsinchu and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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