The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 10, 2004

Filed:

Jan. 22, 2003
Applicant:
Inventors:

Kung Linliu, Hsinchu, TW;

Ming-Hsun Yang, Hsinchu, TW;

Arnold Chang-mou Yang, San Jose, CA (US);

Guey-Chyuan Chen, Pingjen, TW;

Chih-Chieh Hsu, Hsinchu, TW;

Assignee:

Nanodynamics, Inc., Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/04 ; G01D 1/518 ;
U.S. Cl.
CPC ...
B41J 2/04 ; G01D 1/518 ;
Abstract

A method of forming a nozzle plate of an inkjet print head. A silicon chip is provided with an activated device and a first film is formed on the silicon chip, with a first opening corresponding to the activated device. Then, a second film is formed on the first film. Next, a photoresist layer is formed on the second film, such that the photoresist layer has a second opening corresponding to the first opening. Next, the second film under the second opening of the photoresist layer is etched to form a via in the second film passing through the first opening.


Find Patent Forward Citations

Loading…