The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 26, 2005

Filed:

Sep. 18, 2003
Applicants:

Kung Linliu, Hsinchu, TW;

Yi-ren Huang, Hsinchu, TW;

Inventors:

Kung Linliu, Hsinchu, TW;

Yi-Ren Huang, Hsinchu, TW;

Assignee:

Nanodynamics Inc., Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J002/16 ;
U.S. Cl.
CPC ...
Abstract

A self-aligned fabrication process for a nozzle plate of an inkjet print head. A substrate is provided with an activated device and a first film is formed on the substrate. Then, a second film is formed on the first film. Next, the second film is defined to form a convex portion corresponding to the activated device, exposing a part of the surface of the first film. Next, a third film is formed on the exposed surface of the first film, covering the convex portion. The third film on the convex portion is then removed. Next, the convex portion and the first film under the convex portion are etched to form a via.


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