Tokyo, Japan

Koichi Yatsuda

This inventor holds 18 USPTO granted patents and 3 published patent applications and 1 EPO patent, primarily in Semiconductor Manufacturing. Top assignees: Tokyo Electron Limited, Imec Vzw, Tokyo Electron Limi Ted. Active years: 2000-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koichi Yatsuda. Retrieved from https://idiyas.com/inventor/koichi-yatsuda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 18 

% Patents Active = 83.3

 

Average Co-Inventor Count = 2.8

ph-index = 4

Forward Citations = 548(Granted Patents)


Location History:

  • Yamanashi-ken, JP (2000)
  • Saga, JP (2002)
  • Nirasaki, JP (2011 - 2014)
  • Tokyo, JP (2014 - 2023)

Company Filing History:


Years Active: 2000-2023

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Areas of Expertise:
Semiconductor Device
Plasma Etching
FinFET
Hard Mask
Substrate Processing
Vacuum Processing
Contact Pad
Etching Mask
Fabrication Method
Manufacturing Method
18 patents (USPTO):Explore Patents

Title: Innovating Semiconductor Manufacturing: The Contributions of Koichi Yatsuda

Introduction: Koichi Yatsuda, based in Tokyo, Japan, is a prominent inventor renowned for his contributions to the semiconductor industry. With a remarkable portfolio of 18 patents, Yatsuda has revolutionized manufacturing methods that enhance device performance and efficiency. His work exemplifies the intersection of creativity and technical expertise in modern engineering.

Latest Patents: Among his latest innovations, Yatsuda has developed a method for manufacturing semiconductor devices that includes multiple intricate steps. The process involves forming a first insulating film in a transistor structure, creating a sacrifice film, and establishing hard mask patterns for precision. Notably, his approach also details the formation of contact plugs, showcasing his dedication to advancing semiconductor technology.

Additionally, his semiconductor device manufacturing method involves the creation of trenches and vias in a porous low dielectric constant film. This process incorporates embedding a polymer with a urea bond and utilizing a protective filling material, demonstrating his innovative techniques to enhance the performance and reliability of semiconductor devices.

Career Highlights: Koichi Yatsuda has worked with renowned organizations such as Tokyo Electron Limited and Université d'Orléans. His roles at these institutions have provided him with unique opportunities to apply his patentable methods, influencing the field of semiconductor manufacturing significantly.

Collaborations: Throughout his career, Yatsuda has worked alongside talented colleagues, including Tatsuya Yamaguchi and Takashi Hayakawa. These collaborations have fostered an environment of innovation, leading to groundbreaking advancements in semiconductor technology that continue to benefit the industry today.

Conclusion: Koichi Yatsuda's contributions to semiconductor manufacturing exemplify the importance of innovation in technology. With a solid portfolio of patents and collaborations with esteemed colleagues, Yatsuda remains a vital figure in enhancing semiconductor device production, impacting both the present and future of the industry. His inventive spirit continues to inspire the next generation of engineers and inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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