The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2012
Filed:
Oct. 23, 2008
Applicants:
Koichi Yatsuda, Nirasaki, JP;
Eiichi Nishimura, Nirasaki, JP;
Inventors:
Koichi Yatsuda, Nirasaki, JP;
Eiichi Nishimura, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/38 (2006.01); H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract
A feedforward control is performed so that a line width of a mask constituted by an SiNlayerformed by using a photoresistas a mask is to be the same as a line width of a mask pattern constituted by an SiOlayerbased on a measured line width of the photoresistand the measured line width of the mask pattern constituted by the SiOlayer. For example, a control of a trimming amount of the line width of the photoresistis performed so that the line width of the photoresistis to be the same as the line width of the mask pattern constituted by the SiOlayer