Location History:
- Hopewell Jct., NY (US) (2012)
- Hopewell Junction, NY (US) (2002 - 2024)
Company Filing History:
Years Active: 2002-2025
Introduction
Kevin McStay is an accomplished inventor based in Hopewell Junction, NY, known for his significant contributions to the field of semiconductor technology. With a remarkable portfolio of 15 patents, he has been at the forefront of developing advanced imaging devices that utilize single-photon avalanche diodes (SPADs).
Latest Patents
His latest patents focus on semiconductor devices featuring single-photon avalanche diodes and innovative isolation structures designed to enhance performance and reduce crosstalk. These imaging devices incorporate front side deep trench isolation structures that may extend through the semiconductor substrate, providing improved functionality. The design includes a metal filler, such as tungsten, which absorbs photons and helps to mitigate dark current through the implementation of a p-type doped semiconductor liner. Additionally, a silicon dioxide buffer layer is positioned between the metal filler and the doped liner to optimize performance. The isolation structures can be tailored with varying properties, thanks to tapered sections or multi-step formation techniques, and may also utilize fillers like polysilicon or borophosphosilicate glass.
Career Highlights
Kevin has had an impactful career, having worked with prominent companies such as IBM and Globalfoundries Inc. His tenure in these organizations has allowed him to further refine his expertise in semiconductor innovations and to lead pioneering projects in imaging technology.
Collaborations
Throughout his career, Kevin has collaborated with talented professionals, including Jeffrey Bowman Johnson and Chengwen Pei. These partnerships have fostered a collaborative atmosphere that enhances innovation and drives advancements in the semiconductor industry.
Conclusion
Kevin McStay stands out as a visionary in the realm of semiconductor technology, with a strong record of innovation reflected in his patents. His work not only contributes to advancements in imaging devices but also sets the stage for future breakthroughs in the field.
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