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For the Inventor, By the Inventor

Yongin-si, South Korea

Keunwook Shin

USPTO Granted Patents = 44 

 

Average Co-Inventor Count = 5.5

ph-index = 3

Forward Citations = 34(Granted Patents)


Location History:

  • Yongin-si, KR (2017 - 2024)
  • Suwon-si, KR (2024)

Company Filing History:

goldMedal44 out of 131,766 
 
Samsung Electronics Co., Ltd.
 patents
silverMedal2 out of 1,572 
 
Seoul National University
 patents
where one patent can have more than one assignee

Years Active: 2017-2025

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Areas of Expertise:
Nanocrystalline Graphene
Graphene Structure
Interconnect Structure
Two-Dimensional Material
Semiconductor Device
Film Deposition Method
Wiring Structure
Electronic Device
Metal-to-Semiconductor Contact
Vertical Channel Transistor
Hydrogen-Incorporated Oxide Layer
Hybrid Interconnect Structure
44 patents (USPTO):Explore Patents
1. 12506074 - Interconnect structure to reduce contact resistance, electronic device including the same, and method of manufacturing the interconnect structure (2025-12-23),
2. 12421598 - Nanocrystalline graphene and method of forming nanocrystalline graphene (2025-09-23),
3. 12400975 - Interconnect structure and electronic device including the same (2025-08-26),
4. 12389630 - Vertical channel transistor including a graphene insertion layer beweeen a source/drain electrode and a channel pattern (2025-08-12),
5. 12378120 - Wiring including graphene layer and method of manufacturing the same (2025-08-05),
6. 12369359 - Thin film structure and electronic device including two-dimensional material (2025-07-22),
7. 12341063 - Interconnect structure, electronic device including the same, and method of manufacturing interconnect structure (2025-06-24),
8. 12217958 - Method of pre-treating substrate and method of directly forming graphene using the same (2025-02-04),
9. 12211744 - Method of forming nanocrystalline graphene (2025-01-28),
10. 12199165 - Semiconductor device and electronic apparatus including the semiconductor device (2025-01-14),
11. 12183783 - Stacked structure including two-dimensional material and method of fabricating the stacked structure (2024-12-31),
12. 12183780 - Metal-to-semiconductor contact including a 2D crystal material layer (2024-12-31),
13. 12183582 - Film deposition method and element including film deposited by the film deposition method (2024-12-31),
14. 12131905 - Graphene structure and method of forming the graphene structure (2024-10-29),
15. 12103850 - Method of forming graphene (2024-10-01),

Title: The Innovative Mind of Keunwook Shin

Introduction

Keunwook Shin is an accomplished inventor based in Yongin-si, South Korea, with a remarkable portfolio of 37 patents to his name. His work primarily focuses on advancing graphene technologies, which hold significant promise in various fields, including electronics and materials science.

Latest Patents

Among his latest contributions to the field, Keunwook has developed two notable patents. The first patent is a "Method of pre-treating substrate and method of directly forming graphene using the same." This method involves pre-treating a substrate that will have graphene directly formed on it by using a pre-treatment gas that contains a carbon source and hydrogen. The second patent, "Method of forming nanocrystalline graphene," outlines a process in which a substrate with a specific pattern is placed in a reaction chamber. A reaction gas, which includes a carbon source gas, an inert gas, and hydrogen gas, is injected. Through plasma generation in the reaction chamber, nanocrystalline graphene is directly grown on the surface of the patterned substrate at controlled temperatures.

Career Highlights

Keunwook Shin has made significant strides in his career, having worked with prestigious organizations such as Samsung Electronics Co., Ltd. and the Seoul National University R&D Foundation. His experiences in these prominent institutions have earned him recognition in the field of innovative research and development, particularly in graphene-related technologies.

Collaborations

Throughout his career, Keunwook has had the pleasure of collaborating with talented individuals, including Hyeonjin Shin and Changseok Lee. Their teamwork has undoubtedly contributed to the advancement of innovative solutions and breakthroughs in their respective fields.

Conclusion

With a strong track record of patents and an impressive career in research and development, Keunwook Shin exemplifies the spirit of innovation. His work continues to push the boundaries of technology, particularly in the realm of graphene, promising exciting advancements for future applications.

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