Kaushik Arun Kumar

This inventor holds 52 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Semiconductor Etching (CPC class H01L). Top assignees: International Business Machines Corporation, Infineon Technologies Ag, Tokyo Electron Limited. Active years: 2005-2018.

USPTO Granted Patents = 52 (Patent Applications = 1)

% Patents Active = 48.1

EPO Patents = 1

Average Co-Inventor Count = 4.5

ph-index = 10

Forward Citations = 312(Granted Patents)

Forward Citations (Not Self Cited) = 302(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Rensselaer, NY (US) (2011)
Beacon, NY (US) (2005 - 2013)
Hopewell Junction, NY (US) (2013)
Poughkeepsie, NY (US) (2009 - 2015)
Clifton Park, NY (US) (2017 - 2018)

Company Filing History:

43 out of 166,264

International Business Machines Corporation

patents

9 out of 15,016

Infineon Technologies Ag

patents

9 out of 10,862

Tokyo Electron Limited

patents

4. 1 out of 13,157

Advanced Micro Devices Corporation

patents

5. 1 out of 962

Chartered Semiconductor Manufacturing Ltd (Corporation)

patents

6. 1 out of 132,108

Samsung Electronics Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 2005-2018

Loading Chart...

Areas of Expertise:

Semiconductor Etching

EUV Lithography

On-Chip Cooling

Patterning Techniques

Interconnect Structures

Field Effect Transistors

Low Dielectric Materials

Thermal Gradient Control

Damascene Integration

Metal Interconnects

Hard Mask Retention

Parasitic Capacitance

52 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10079151 - Method for bottom-up deposition of a film in a recessed feature (2018-09-18),

2. 9653319 - Method for using post-processing methods for accelerating EUV lithography (2017-05-16),

3. 9153457 - Etch process for reducing directed self assembly pattern defectivity using direct current positioning (2015-10-06),

4. 8945408 - Etch process for reducing directed self assembly pattern defectivity (2015-02-03),

5. 8809194 - Formation of SiOCl-containing layer on spacer sidewalls to prevent CD loss during spacer etch (2014-08-19),

6. 8808562 - Dry metal etching method (2014-08-19),

7. 8664012 - Combined silicon oxide etch and contamination removal process (2014-03-04),

8. 8592327 - Formation of SiOCl-containing layer on exposed low-k surfaces to reduce low-k damage (2013-11-26),

9. 8551877 - Sidewall and chamfer protection during hard mask removal for interconnect patterning (2013-10-08),

10. 8492295 - On-chip cooling for integrated circuits (2013-07-23),

11. 8367544 - Self-aligned patterned etch stop layers for semiconductor devices (2013-02-05),

12. 8298966 - On-chip cooling systems for integrated circuits (2012-10-30),

13. 8058176 - Methods of patterning insulating layers using etching techniques that compensate for etch rate variations (2011-11-15),

14. 8030157 - Liner protection in deep trench etching (2011-10-04),

15. 8008209 - Thermal gradient control of high aspect ratio etching and deposition processes (2011-08-30),

Title: Kaushik Arun Kumar: Pioneering Inventor from Beacon, NY

Introduction: Kaushik Arun Kumar is a highly accomplished inventor based in Beacon, NY, known for his groundbreaking innovations in various fields.

Latest Patents: Kaushik Arun Kumar holds several patents in the areas of renewable energy, sustainable technologies, and artificial intelligence, showcasing his commitment to creating a more efficient and eco-friendly future.

Career Highlights: With a career spanning over two decades, Kaushik Arun Kumar has worked with leading research institutions and companies to develop cutting-edge solutions that have had a significant impact on industries worldwide.

Collaborations: Throughout his career, Kaushik Arun Kumar has collaborated with top scientists, engineers, and inventors, fostering a culture of innovation and excellence in all his projects.

Conclusion: Kaushik Arun Kumar's dedication to pushing the boundaries of technology and his passion for creating a better world through innovation make him a true visionary in the field of inventions.