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For the Inventor, By the Inventor

Beacon, NY, United States of America

Kaushik Arun Kumar

USPTO Granted Patents = 52 


Average Co-Inventor Count = 4.5

ph-index = 10

Forward Citations = 310(Granted Patents)

Forward Citations (Not Self Cited) = 302(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Rensselaer, NY (US) (2011)
  • Beacon, NY (US) (2005 - 2013)
  • Hopewell Junction, NY (US) (2013)
  • Poughkeepsie, NY (US) (2009 - 2015)
  • Clifton Park, NY (US) (2017 - 2018)

Company Filing History:

goldMedal43 out of 164,197 
 
International Business Machines Corporation
 patents
silverMedal9 out of 14,724 
 
Infineon Technologies Ag
 patents
bronzeMedal9 out of 10,326 
 
Tokyo Electron Limited
 patents
4. 1 out of 131,611 
 
Samsung Electronics Co., Ltd.
 patents
5. 1 out of 12,883 
 
Advanced Micro Devices Corporation
 patents
6. 1 out of 962 
 
Chartered Semiconductor Manufacturing Ltd (corporation)
 patents
where one patent can have more than one assignee

Years Active: 2005-2018

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Areas of Expertise:
EUV Lithography
Directed Self Assembly
Silicon Oxide Etching
On-Chip Cooling
Self-Aligned Etch Stop Layers
Dual Damascene Integration
Field Effect Transistors
Parasitic Capacitance Reduction
Metal Interconnects
High Aspect Ratio Etching
Polycarbosilane Etch Stops
Copper Recess Process
52 patents (USPTO):Explore Patents
1. 10079151 - Method for bottom-up deposition of a film in a recessed feature (2018-09-18),
2. 9653319 - Method for using post-processing methods for accelerating EUV lithography (2017-05-16),
3. 9153457 - Etch process for reducing directed self assembly pattern defectivity using direct current positioning (2015-10-06),
4. 8945408 - Etch process for reducing directed self assembly pattern defectivity (2015-02-03),
5. 8809194 - Formation of SiOCl-containing layer on spacer sidewalls to prevent CD loss during spacer etch (2014-08-19),
6. 8808562 - Dry metal etching method (2014-08-19),
7. 8664012 - Combined silicon oxide etch and contamination removal process (2014-03-04),
8. 8592327 - Formation of SiOCl-containing layer on exposed low-k surfaces to reduce low-k damage (2013-11-26),
9. 8551877 - Sidewall and chamfer protection during hard mask removal for interconnect patterning (2013-10-08),
10. 8492295 - On-chip cooling for integrated circuits (2013-07-23),
11. 8367544 - Self-aligned patterned etch stop layers for semiconductor devices (2013-02-05),
12. 8298966 - On-chip cooling systems for integrated circuits (2012-10-30),
13. 8058176 - Methods of patterning insulating layers using etching techniques that compensate for etch rate variations (2011-11-15),
14. 8030157 - Liner protection in deep trench etching (2011-10-04),
15. 8008209 - Thermal gradient control of high aspect ratio etching and deposition processes (2011-08-30),

Title: Kaushik Arun Kumar: Pioneering Inventor from Beacon, NY

Introduction: Kaushik Arun Kumar is a highly accomplished inventor based in Beacon, NY, known for his groundbreaking innovations in various fields.

Latest Patents: Kaushik Arun Kumar holds several patents in the areas of renewable energy, sustainable technologies, and artificial intelligence, showcasing his commitment to creating a more efficient and eco-friendly future.

Career Highlights: With a career spanning over two decades, Kaushik Arun Kumar has worked with leading research institutions and companies to develop cutting-edge solutions that have had a significant impact on industries worldwide.

Collaborations: Throughout his career, Kaushik Arun Kumar has collaborated with top scientists, engineers, and inventors, fostering a culture of innovation and excellence in all his projects.

Conclusion: Kaushik Arun Kumar's dedication to pushing the boundaries of technology and his passion for creating a better world through innovation make him a true visionary in the field of inventions.

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