This inventor holds 24 USPTO granted patents and 2 published patent applications and 16 EPO patents, primarily in Photosensitive Resin Technology. Top assignees: Shin-Etsu Chemical Co., Ltd., International Business Machines Corporation. Active years: 2014-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Jyoetsu, JP (2016 - 2020)
- Joetsu, JP (2014 - 2024)
Company Filing History:
24 out of 5,989 
2 out of 166,425 
Years Active: 2014-2025
Areas of Expertise:
Title: Hiroyuki Urano: Innovator in Photosensitive Resin Technology
Introduction: Hiroyuki Urano, based in Jyoetsu, Japan, is a prominent inventor known for his significant contributions to the field of photosensitive resin compositions. With 24 patents to his name, Urano has demonstrated a commitment to innovation and excellence in materials science.
Latest Patents: Among his latest patents, Urano has developed a negative photosensitive resin composition that features an alkali-soluble resin incorporating structures from polyimides, polyamides, polybenzoxazoles, and polyamide-imides. This innovative resin composition also includes a polymer compound formed through cyclopolymerization, a light-activated acid-generating compound, and a heat crosslinking agent. In addition, his positive photosensitive resin composition utilizes similar resin structures but enhances the dissolution speed in alkaline solutions through the inclusion of a quinonediazide structure, allowing for efficient patterning processes and film creation.
Career Highlights: Throughout his career, Urano has been associated with influential companies, notably Shin-Etsu Chemical Co., Ltd. and International Business Machines Corporation (IBM). His work focuses on advancing technologies for interlayer insulation films and surface protective films that are essential in the development of electronic components.
Collaborations: During his tenure, Urano has collaborated with notable professionals in the industry, including Katsuya Takemura and Masashi Iio. Their combined expertise has contributed to the development of groundbreaking innovations in resin technology.
Conclusion: Hiroyuki Urano stands out as a key figure in the realm of photosensitive resin compositions, with an impressive portfolio of patents that underscore his innovative spirit. His contributions not only enhance technological advancements but also pave the way for future developments in electronic components and materials science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile