The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2021
Filed:
Mar. 12, 2018
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/023 (2006.01); G03F 7/039 (2006.01); G03F 7/038 (2006.01); G03F 7/30 (2006.01); C08G 73/12 (2006.01); C08G 73/10 (2006.01); C08G 73/14 (2006.01); G03F 7/40 (2006.01); G03F 7/32 (2006.01); G03F 7/20 (2006.01); C09D 179/08 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0233 (2013.01); C08G 73/1039 (2013.01); C08G 73/1042 (2013.01); C08G 73/1071 (2013.01); C08G 73/12 (2013.01); C08G 73/14 (2013.01); C09D 179/08 (2013.01); G03F 7/0387 (2013.01); G03F 7/0388 (2013.01); G03F 7/0392 (2013.01); G03F 7/20 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01);
Abstract
This is to provide a polymer of a polyimide precursor which is soluble in an aqueous alkaline solution, and capable of using a base resin of a positive type and negative type photosensitive resin composition which is capable of forming a fine pattern and obtaining high resolution. Also provided is a positive type and negative type photosensitive resin composition using such a polymer of a polyimide precursor. Further provided are a patterning process and a method of forming a cured film using the composition.