The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2023
Filed:
Apr. 14, 2020
International Business Machines Corporation, Armonk, NY (US);
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Dmitry Zubarev, San Jose, CA (US);
Hiroyuki Urano, Joetsu, JP;
Katsuya Takemura, Joetsu, JP;
Masashi Iio, Joetsu, JP;
Kazuya Honda, Yokohama, JP;
Yoshio Kawai, Kawasaki, JP;
International Business Machines Corporation, Armonk, NY (US);
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
Provided is a compound that can be used as a base resin for a photosensitive resin composition. The photosensitive resin can form a fine pattern and can achieve high resolution without impairing mechanical strength and solubility. The compound is represented by the general formula (1): wherein Z represents a linear, branched or cyclic divalent hydrocarbon group having 2 to 30 carbon atoms; Xto Xrepresent any of —CO—, —CONR—, —O—, —NR—, —S—, —SO—, —SO— and —SONR— and may be the same as or different from each other, provided that Ris a hydrogen atom or a monovalent hydrocarbon group having 1 to 30 carbon atoms; Ar represents a divalent aromatic group having 2 to 30 carbon atoms; Land Lindependently represent a divalent hydrocarbon group having 1 to 30 carbon atoms; and x and y are each independently 0 or 1.