The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 06, 2024

Filed:

Sep. 08, 2021
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Hiroyuki Urano, Joetsu, JP;

Masashi Iio, Joetsu, JP;

Katsuya Takemura, Joetsu, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/075 (2006.01); G03F 7/004 (2006.01); G03F 7/16 (2006.01); G03F 7/40 (2006.01); G03F 7/38 (2006.01); G03F 7/023 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0757 (2013.01); G03F 7/0045 (2013.01); G03F 7/16 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01);
Abstract

A photosensitive resin composition, a patterning process performed using the photosensitive resin composition, a cured film formed by curing the pattern, and an electronic component having the cured film. The photosensitive resin composition includes a resin, a photosensitizer, a surfactant containing a structural unit represented by formula (1), and a solvent, where Yand Yeach independently represent a hydrogen atom, a methyl group, a phenyl group, or a group represented by formula (2), at least one of Yand Yis a group represented by formula (2), Rto Rare monovalent hydrocarbon groups that may be the same or different and optionally contain a heteroatom, having 1 to 20 carbon atoms, '1' and “n” are each independently integers of 1 to 100, and “m” is an integer of 0 to 100.


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