Shanghai, China

Haoyu Chen

This inventor holds 28 USPTO granted patents and 19 published patent applications, primarily in Semiconductor Manufacturing. Top assignees: Shanghai Huali Microelectronics Corporation, Shanghai Huali Integrated Circuit Corporation, Shanghai Huali Integrated Circuit Mfg. Co., Ltd.. Active years: 2021-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haoyu Chen. Retrieved from https://idiyas.com/inventor/haoyu-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 28 

% Patents Active = 82.1

Average Co-Inventor Count = 3.8

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021-2026

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Areas of Expertise:
ReRAM
SONOS Memory
CMOS Image Sensor
Flash Memory
Semiconductor Structure
High-Voltage Device
Global Shutter
Stack Capacitor
Leakage Improvement
Process Integration
Silicon Controlled Rectifier
28 patents (USPTO):Explore Patents

Title: Profiling Inventor Haoyu Chen: Innovations in Semiconductor Technology

Introduction: Haoyu Chen, an esteemed inventor based in Shanghai, China, has made significant contributions to the field of semiconductor technology. With an impressive portfolio of 18 patents, his innovative methods and devices continue to advance the industry.

Latest Patents: Among Chen's latest patents are notable inventions that showcase his expertise. The first patent, titled "Method for Making Active Area Air Gap," discloses a comprehensive method involving word line etching and protective spacer formation. This process enables the creation of an active area air gap that enhances device performance. Another significant patent, "SONOS Memory and Method for Making the Same," outlines a method for manufacturing SONOS memory. This invention involves a detailed procedural approach to form vertical structures that improve device performance and efficiency.

Career Highlights: Haoyu Chen has worked with prominent companies in the semiconductor sector, notably Shanghai Huali Microelectronics Corporation and Shanghai Huali Integrated Circuit Corporation. His experience at these companies has equipped him with the skills and knowledge necessary for his inventive endeavors.

Collaborations: Throughout his career, Chen has collaborated with talented individuals such as Zhi Tian and Hua Shao. These collaborations have contributed to his innovative projects and led to the successful development of various patented technologies.

Conclusion: Haoyu Chen's dedication to innovation in semiconductor technology is reflected in his extensive patent portfolio. His latest inventions demonstrate a commitment to enhancing device performance and efficiency, solidifying his reputation as a leading inventor in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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