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Frederik Bijkerk

This inventor holds 16 USPTO granted patents and 5 published patent applications and 5 EPO patents. Top assignees: Carl Zeiss Smt Gmbh, Asml Netherlands B.v., Carl-Zeiss-Smt Ag. Active years: 2002-2022.

USPTO Granted Patents = 16 (Patent Applications = 5)

% Patents Active = 62.5

EPO Patents = 5 (Patent Applications = 6)

Average Co-Inventor Count = 4.6

ph-index = 6

Forward Citations = 120(Granted Patents)

Location History:

Amsterdam, NL (2002 - 2010)
Bosch en Duin, NL (2013 - 2022)

Company Filing History:

Asml Netherlands B.v.

Years Active: 2002-2022

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16 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11360393 - Mirror, in particular for a microlithographic projection exposure system (2022-06-14),

2. 10916356 - Reflective optical element (2021-02-09),

3. 9997268 - EUV-mirror, optical system with EUV-mirror and associated operating method (2018-06-12),

4. 9733580 - Method for producing a reflective optical element for EUV-lithography (2017-08-15),

5. 9442383 - EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating method (2016-09-13),

6. 8638494 - Reflective optical element and method of manufacturing the same (2014-01-28),

7. 8411355 - Reflective optical element and method of manufacturing the same (2013-04-02),

8. RE41362 - Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby (2010-05-31),

9. 7261957 - Multilayer system with protecting layer system and production method (2007-08-28),

10. 7172788 - Optical element and method for its manufacture as well as lithography apparatus and method for manufacturing a semiconductor device (2007-02-06),

11. 6818912 - Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby (2004-11-16),

12. 6667484 - Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby (2003-12-23),

13. 6656575 - Multilayer system with protecting layer system and production method (2003-12-02),

14. 6483597 - Method for the production of multi-layer systems (2002-11-19),

15. 6469310 - Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus (2002-10-22),

Title: Frederik Bijkerk: Pioneering Innovations in Optics

Introduction:

Frederik Bijkerk, a visionary inventor hailing from Bosch en Duin, NL, has left an indelible mark on the world of inventions with his relentless pursuit of innovation. With 16 patents under his belt, Bijkerk's groundbreaking work continues to inspire aspiring inventors and innovators worldwide.

Latest Patents:

Among his latest patents is a cutting-edge "Mirror, in particular for a microlithographic projection exposure system," revolutionizing optical technologies. This mirror features a unique design with piezoelectric layers that enable locally variable deformations, enhancing its reflective capabilities. Another notable invention is the "Reflective Optical Element" optimized for working wavelengths between 1 nm to 12 nm, utilizing a sophisticated multilayer system for superior performance.

Career Highlights:

Bijkerk's illustrious career includes stints at prestigious companies such as Carl Zeiss SMT GmbH and ASML Netherlands B.V., where he honed his expertise in optical engineering and made significant contributions to the field. His innovative approach to problem-solving and commitment to excellence have cemented his reputation as a trailblazer in the industry.

Collaborations:

Throughout his career, Bijkerk has collaborated with top-tier professionals in the field, including esteemed coworkers like Eric Louis and Andrey E. Yakshin. These collaborative efforts have led to groundbreaking advancements in optical technology and paved the way for new possibilities in the realm of inventions.

Conclusion:

In conclusion, Frederik Bijkerk's unwavering dedication to pushing the boundaries of innovation has established him as a true pioneer in the world of inventions. His remarkable contributions and trailblazing spirit serve as a guiding light for future generations of inventors, inspiring them to think boldly and strive for excellence in all their endeavors.

Profile summary based on public USPTO records.

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