The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2013
Filed:
Jan. 07, 2011
Tim Tsarfati, Utrecht, NL;
Erwin Zoethout, Utrecht, NL;
Eric Louis, IJsselstein, NL;
Frederik Bijkerk, Bosch en Duin, NL;
Tim Tsarfati, Utrecht, NL;
Erwin Zoethout, Utrecht, NL;
Eric Louis, IJsselstein, NL;
Frederik Bijkerk, Bosch en Duin, NL;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A reflective optical element e.g. for use in EUV lithography, configured for an operating wavelength in the soft X-ray or extreme ultraviolet wavelength range, includes a multilayer system () with respective layers of at least two alternating materials () having differing real parts of the refractive index at the operating wavelength. Preferably, at least at an interface from the material () having the higher real part of the refractive index to the material () having the lower real part of the refractive index, a further layer () of a nitride or a carbide of the material () having the lower real part is arranged. Particularly preferably the material () having the lower real part of the refractive index is lanthanum or thorium. Preferably, the layers () of at least one material are applied in a plasma-based process for manufacturing a reflective optical element as described.