The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2007
Filed:
Oct. 02, 2002
Andrey E. Yakshin, Nieuwegein, NL;
Eric Louis, Ijsselstein, NL;
Frederik Bijkerk, Amsterdam, NL;
Marco Wedowski, Aalen, DE;
Roman Klein, Berlin, DE;
Frank Stietz, Baunatal, DE;
Andrey E. Yakshin, Nieuwegein, NL;
Eric Louis, Ijsselstein, NL;
Frederik Bijkerk, Amsterdam, NL;
Marco Wedowski, Aalen, DE;
Roman Klein, Berlin, DE;
Frank Stietz, Baunatal, DE;
Carl Zeiss SMT AG, , DE;
Abstract
In order to reduce contamination of optical elements which comprise a multilayer system on a substrate, it is proposed that the layer material and/or the layer thickness of at least one layer of the multilayer system are/is selected such that the standing wave which forms during reflection of the irradiated operating wavelength, forms a node of the electrical field intensity (node condition) in the area of the free interface of the multilayer system. Furthermore, a method for determining a design of a multilayer system, as well as a manufacturing process and a lithography apparatus are described.