The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2016
Filed:
Sep. 23, 2013
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Udo Dinger, Oberkochen, DE;
Frederik Bijkerk, Bosch en Duin, NL;
Muharrem Bayraktar, Enschede, NL;
Oliver Dier, Lauchheim, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An EUV mirror arrangement () has a multiplicity of mirror elements () which are arranged alongside one another and jointly form a mirror surface of the mirror arrangement. Each mirror element has a substrate () and a multilayer arrangement () applied on the substrate and having a reflective effect with respect to radiation from the extreme ultraviolet range (EUV), said multilayer arrangement comprising a multiplicity of layer pairs () having alternate layers composed of a high refractive index layer material and a low refractive index layer material. The multilayer arrangement has an active layer () arranged between a radiation entrance surface and the substrate and consisting of a piezoelectrically active layer material, the layer thickness (z) of which active layer can be altered by the action of an electric field. For each active layer provision is made of an electrode arrangement for generating an electric field acting on the active layer.