The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2002
Filed:
Dec. 17, 1999
Henryk Fiedorowicz, Warszawa, PL;
Frederik Bijkerk, Amsterdam, NL;
Cornelis C. De Bruijn, Sprundel, NL;
Andrzej Bartnik, Warszawa, PL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A radiation source of a radiation system of a lithographic projection apparatus includes a primary jet nozzle constructed and arranged to eject a primary gas or liquid in a first direction; a supply for the primary gas or liquid which is to be brought into an excited energy state when ejected from the primary nozzle and is to emit ultraviolet electromagnetic radiation when falling back to a lower energy state; an exciting mechanism such as a laser for bringing the primary gas or liquid into the excited energy state; a secondary jet nozzle constructed and arranged to eject a secondary gas or liquid in the first direction and positioned aside, possibly enclosing, the primary jet nozzle ; and a supply for the secondary gas or liquid.