Portland, OR, United States of America

Daniel Ouellette

USPTO Granted Patents = 15 

 

Average Co-Inventor Count = 9.8

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2020-2025

Loading Chart...
Loading Chart...
15 patents (USPTO):

Title: **Innovator Spotlight: Daniel G. Ouellette**

Introduction

Daniel G. Ouellette is an accomplished inventor based in Portland, Oregon. He is recognized for his expertise in integrated circuit structures, leading to impactful innovations in the field of semiconductor technology. His contributions significantly advance the capabilities of modern electronics.

Latest Patents

Daniel G. Ouellette holds a patent for the fabrication of gate-all-around integrated circuit structures that incorporate molybdenum nitride metal gates and gate dielectrics with a dipole layer. The patent describes an integrated circuit structure consisting of a first vertical arrangement of horizontal nanowires and a second vertical arrangement of horizontal nanowires. Notably, the first gate stack is positioned over the first vertical arrangement and comprises a P-type conductive layer on a first gate dielectric, integrating molybdenum and nitrogen. Meanwhile, the second gate stack, located over the second vertical arrangement, features an N-type conductive layer on a second gate dielectric. This innovative design promises to enhance the performance and efficiency of integrated circuits.

Career Highlights

Daniel G. Ouellette is currently employed at Intel Corporation, a leading company in technology and innovation. His work there has allowed him to apply his knowledge and skills in a cutting-edge environment, contributing to significant advancements in semiconductor technologies.

Collaborations

Throughout his career, Daniel has collaborated with talented professionals in the industry, including notable colleagues Daniel B. O'Brien and Jeffrey S. Leib. Together, they contribute to Intel Corporation’s commitment to innovation and excellence in technology.

Conclusion

Daniel G. Ouellette’s contributions through his patent and work at Intel Corporation exemplify the spirit of innovation that drives progress in the technology sector. His dedication to advancing integrated circuit structures is a testament to his skills as an inventor and his impact on the electronics industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…