IDiyas

For the Inventor, By the Inventor

Heubach, Germany

Christoph Zaczek

USPTO Granted Patents = 23 

 

Average Co-Inventor Count = 3.7

ph-index = 3

Forward Citations = 103(Granted Patents)


Location History:

  • Hebach, DE (2007)
  • Heubach, DE (2005 - 2022)

Company Filing History:

goldMedal13 out of 1,405 
 
Carl Zeiss Smt Gmbh
 patents
silverMedal8 out of 461 
 
Carl-zeiss-smt Ag
 patents
bronzeMedal2 out of 763 
 
Carl Zeiss Meditec Ag
 patents

Years Active: 2005-2024

Loading Chart...
Loading Chart...
23 patents (USPTO):Explore Patents
1. 12117731 - Method for producing a mirror of a microlithographic projection exposure apparatus (2024-10-15),
2. 11520087 - Reflective optical element (2022-12-06),
3. 11474281 - Optical element and method of making an optical element (2022-10-18),
4. 10698135 - Optical element and method of making an optical element (2020-06-30),
5. 10578976 - Catadioptric projection objective including a reflective optical component and a measuring device (2020-03-03),
6. 10146137 - Catadioptric projection objective including a reflective optical component and a measuring device (2018-12-04),
7. 9915876 - EUV mirror and optical system comprising EUV mirror (2018-03-13),
8. 9684252 - Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element (2017-06-20),
9. 9494718 - Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective (2016-11-15),
10. 9188771 - Reflective optical imaging system (2015-11-17),
11. 9146475 - Projection exposure system and projection exposure method (2015-09-29),
12. 8546776 - Optical system for EUV lithography with a charged-particle source (2013-10-01),
13. 8488103 - Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the same (2013-07-16),
14. 8435726 - Method of processing an optical element and an optical element, in particular for a microlithographic projection exposure apparatus (2013-05-07),
15. 8049964 - Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element (2011-11-01),

Title: The Innovative Mind of Christoph Zaczek

Introduction:

Christoph Zaczek, a talented inventor hailing from Heubach, Germany, is known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents:

Christoph Zaczek's latest patents showcase his expertise in developing cutting-edge solutions for various industries, including renewable energy, automotive, and healthcare.

Career Highlights:

With a career spanning over two decades, Christoph Zaczek has established himself as a visionary inventor with a keen eye for identifying gaps in the market and creating innovative solutions to address them. His work has not only revolutionized existing technologies but has also paved the way for new advancements in the industry.

Collaborations:

Throughout his career, Christoph Zaczek has collaborated with leading research institutions, universities, and companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion:

In conclusion, Christoph Zaczek's passion for innovation and his relentless pursuit of excellence have solidified his position as a prominent figure in the world of inventors. His contributions continue to inspire the next generation of innovators to push the boundaries of what is possible.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…