The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2024
Filed:
Dec. 13, 2022
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Christoph Zaczek, Heubach, DE;
Erik Loopstra, Ederheim Huernheim, DE;
Eric Eva, Aalen, DE;
Drew Chieda, Wilton, CT (US);
Matthew Lipson, Wilton, CT (US);
Victor Perez-Falcon, Wilton, CT (US);
Moshe Shemesh, Wilton, CT (US);
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
This disclosure relates to a method for producing a mirror of a microlithographic projection exposure apparatus, a first mirror part and a second mirror part being provided, which are in contact in the region of a first connecting surface of the first mirror part and a second connecting surface of the second mirror part. For forming a durable connection between the first mirror part and the second mirror part, the first mirror part and the second mirror part are heated up to a holding temperature of at least 400° C. and are kept at the holding temperature during a holding time. After the holding time has elapsed, the first mirror part and the second mirror part are cooled down to a first cooling temperature at a first cooling rate of less than or equal to 100 K/h.