The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Dec. 13, 2012
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Dirk Heinrich Ehm, Lauchheim, DE;
Markus Weiss, Aalen, DE;
Christoph Zaczek, Heubach, DE;
Tobias Hackl, Langenau, DE;
Wolfgang Seitz, Rainau, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
To prevent reflective optical elements () for EUV lithography from becoming electrically charged as they are irradiated with EUV radiation (), an optical system for EUV lithography is proposed, having a reflective optical element (), including a substrate () with a highly reflective coating () emitting secondary electrons when irradiated with EUV radiation (), and a source () of electrically charged particles, which is arranged in such a manner that electrically charged particles are applied to the reflective optical element (), wherein the source () for the charge carrier compensation is exclusively a flood gun applying electrons to the reflective optical element ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile