The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2017
Filed:
Oct. 25, 2011
Christoph Zaczek, Heubach, DE;
Alexandra Pazidis, Aalen, DE;
Christoph Zaczek, Heubach, DE;
Alexandra Pazidis, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An optical element () transparent for radiation with a wavelength λ in the ultraviolet wavelength range below 250 nm, in particular at 193 nm, comprises a substrate () with a refractive index nlarger than 1.6, and an antireflection coating () formed on at least part of the surface of the substrate () between the substrate () and an ambient medium with a refractive index n, preferably with n=1.0. The antireflection coating () consists of a single layer of a material with a refractive index nof about n=√{square root over (nn)}, in particular n>1.3, and the optical thickness dof the single layer is about λ/4. The optical element () is preferably part of a projection objective () in a microlithography projection exposure apparatus () and located adjacent to a light-sensitive substrate ().