The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2018
Filed:
Jul. 10, 2015
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An EUV mirror with a substrate and a multilayer arrangement including: a periodic first layer group having N>1 first layer pairs of period thickness Pand arranged on a radiation entrance side of the multilayer arrangement; a periodic second layer group having N>1 second layer pairs of period thickness Pand arranged between the first layer group and the substrate; and a third layer group having Nthird layer pairs arranged between the first and second layer groups. N>N. The third layer group has a third period thickness Pwhich deviates from an average period thickness P=(P+P)/2 by a period thickness difference ΔP. ΔP corresponds to the quotient of the optical layer thickness (λ/4) of a quarter-wave layer and the product of Nand cos(AOI), AOIbeing the mean incidence angle for which the multilayer arrangement is designed.