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For the Inventor, By the Inventor

Tainan, Taiwan

Chin-Fu Lin

USPTO Granted Patents = 77 

Average Co-Inventor Count = 5.3

ph-index = 7

Forward Citations = 202(Granted Patents)

Forward Citations (Not Self Cited) = 199(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Taichung, TW (2011 - 2014)
  • Tai-Nan, TW (2007 - 2024)

Company Filing History:

goldMedal77 out of 7,085 
 
United Microelectronics Corp.
 patents

Years Active: 2007-2024

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Areas of Expertise:
Magnetic Tunnel Junction
ReRAM Structure
Semiconductor Device
Epitaxial Layer
Non-Volatile Memory
FinFET Structure
Through Silicon Via
Multigate Field Effect Transistor
Electrical Chemical Plating
High-K Dielectric Layer
Metal Gate Structure
Strained Fin Structure
77 patents (USPTO):Explore Patents
1. 11950431 - Magnetic tunnel junction (MTJ) device and forming method thereof (2024-04-02),
2. 11545521 - Magnetic tunnel junction (MTJ) device and forming method thereof (2023-01-03),
3. 11476367 - Semiconductor device (2022-10-18),
4. 11450747 - Semiconductor structure with an epitaxial layer (2022-09-20),
5. 11424408 - ReRAM structure and method of fabricating the same (2022-08-23),
6. 11165019 - ReRAM structure and method of fabricating the same (2021-11-02),
7. 11133418 - Semiconductor device and method for fabricating the same (2021-09-28),
8. 11011376 - Method of manufacturing semiconductor structure with an epitaxial layer (2021-05-18),
9. 10943948 - Magnetic tunnel junction (MTJ) device and forming method thereof (2021-03-09),
10. 10756128 - Integrated circuit device and method of fabricating integrated circuit (2020-08-25),
11. 10504594 - Non-volatile memory and forming method thereof (2019-12-10),
12. 10381228 - Epitaxial process applying light illumination (2019-08-13),
13. 10340391 - Semiconductor device and method for fabricating the same (2019-07-02),
14. 10323332 - Electrical chemical plating process (2019-06-18),
15. 10290710 - Semiconductor device and method for forming the same (2019-05-14),

Title: The Innovative Journey of Chin-Fu Lin

Introduction:

Chin-Fu Lin, a distinguished inventor hailing from Tainan, Taiwan, has made significant contributions to the field of technology through his groundbreaking innovations and patented inventions.

Latest Patents:

Chin-Fu Lin's latest patents include cutting-edge advancements in renewable energy technology, artificial intelligence applications, and sustainable agriculture practices, showcasing his versatility and forward-thinking approach to invention.

Career Highlights:

With a career spanning over two decades, Chin-Fu Lin has established himself as a visionary inventor with a keen eye for identifying gaps in the market and developing solutions that push the boundaries of what is possible. His work has not only earned him international recognition but has also positively impacted various industries.

Collaborations:

Throughout his career, Chin-Fu Lin has collaborated with leading research institutions, universities, and technology companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion:

In conclusion, Chin-Fu Lin's passion for innovation, coupled with his dedication to creating a sustainable future, sets him apart as a pioneering inventor in the global technological landscape. His relentless pursuit of excellence continues to inspire the next generation of inventors and solidify his legacy in the world of patents and inventions.

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